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The future development of ITO targets generally has the following trends:
1. Decrease the resistivity. As the trend toward the development of LCDs has become more refined, and its drivers are different, transparent conductive films with smaller resistivities are needed.
2. High density. The direct benefits of improved target density are mainly reflected in reduced blackening and reduced resistivity. If the target material is of low density, the effective sputtering surface area will be reduced, the sputtering speed will be reduced, and the blackening of the target surface will be exacerbated. The surface of the high-density target has few changes, and a low-resistance film can be obtained. Target density is also related to life. High-density targets have a longer life, which means that target costs can be reduced.
3. Large size. With the continuous development of the trend toward slimming and low price of liquid crystal module products, the corresponding ITO glass substrates have also become increasingly large-scale, so that the size of single-chip ITO targets is becoming larger.
4. Target body integration. As mentioned above, the target material will develop toward a large area. In the past, when the technical capacity was insufficient, multiple targets must be used to make a large area. However, due to the joints will cause the quality of the coating to decline, most of the targets are currently formed as a whole. In order to improve the quality and utilization of the coating. The increase in size of future new generation LCD glass substrates poses a severe challenge to target manufacturers.
5. Use high efficiency. The increase in the use of targets has always been the direction of joint efforts of equipment manufacturers, users and target manufacturers. At present, the target utilization rate can reach 40%. With the increase in the cost requirements of the liquid crystal display industry, improving the utilization of ITO targets will also be one of the directions for the future research and development of targets.
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